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Research methods - Soft-lithography
Self-assembly is a universal phenomenon, occurring everywhere in nature and can lead to technologically interesting approaches, for the bottom-up fabrication of functional nanostructures . Especially for the case of self-assembly in molecules the interest in the last decades has grown exponentially. The structures emerging from molecular self-assembly are of great interest for basic research and technological applications, since the processes that generate them may be used in nanoscale engineering and architecture.
(Click for larger image)
Confinement of perpendicular lamallae formation in a block-copolymer thin film, by means of surface energy modification of the underlying substrate, using self-assembled monolayers of thiols (for more details refer to V. Kapaklis et al., J. Nanosc. Nanotechn. 10, 6056 (2010)).
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Tapping mode AFM scan of a phase-separated PS-b-PMMA film, spin-coated on a thiol coated Au layer. Defect free perpendicular lamellar arrangement can be observed (for more details refer to V. Kapaklis et al., J. Nanosc. Nanotechn. 10, 6056 (2010)). |
Demonstration of large area nanopatterning using self assembled colloidal etch masks (Courtesy E. Th. Papaioannou, V. Kapaklis). |
Demonstration of lift-off using a colloidal self assembled shadow mask. The underlying patterned film, contains holes of 280 nm in diameter, arranged on an hexagonal lattice. The film material is Ni, used for magneto-plasmonic studies (Courtesy E. Th. Papaioannou, V. Kapaklis). |